The global wafer cleaning equipment market size is anticipated to reach around US$ 14,500 Mn by 2027 and is anticipated to grow at a CAGR of around 10% in terms of revenue during the forecast period 2020 – 2027.
Wafer cleaning process is the removal without modifying surface content of chemical and particulate impurities from the surface of the semiconductor. Due to the presence of particulate impurities and pollutants on wafer surface, the performance and durability of the systems is impacted. However, cleaning is necessary to eliminate these residues and to boost semiconductor efficiency in various industries. The wafer cleaning process includes the preservation and non-contamination of wafers surfaces.
A continuously rising market in the electronics and semiconductor industry are the factors that are propelling the growth of global wafer cleaning equipment market. Due to the current market continuous development towards high efficiency and miniature facilities, preserving silicon wafers without contamination is extremely essential. The wafer cleaning equipment market is expected to continue to show strong growth in the coming years due to the increasing demand for high-performance electronic products. Due to its massive growth in semiconductor and electronics industry, business growth is mainly dominated by the Asia Pacific.
Market for 300 mm wafer size to grow at highest CAGR during forecast period (2020–2027)
The market value of the 300 mm wafer is likely to grow during the forecast period at the highest CAGR. These wafers are used by the manufacturers in a single lot to produce a huge number of products. This is one of the factors that manufacturers are using 300 mm wafers to build semiconductive devices.
The market research study on “Wafer Cleaning Equipment Market (By Technology: Wet Chemical Cleaning Processes, Vapor Dry Cleaning Processes, Aqueous Cleaning Processes, Cryogenic Aerosols & Super Critical Fluid Cleaning, Emerging Technologies; By Equipment Type: Single-wafer Spray Systems, Single wafer cryogenic Systems, Batch Immersion Cleaning Systems, Batch Spray Cleaning Systems, Scrubber; By Wafer Size: <150mm, 200mm, 300mm; By Operation Mode: Automatic Equipment, Semi-Automatic Equipment, Manual Equipment; By Application: MEMS, CIS, Memory, RF devices, LED, Interposer, Logic, Others) - Global Industry , Analysis, Market Size, Opportunities and Forecast, 2020 - 2027” offers detailed insights on the global wafer cleaning equipment market entailing insights on its different market segments. Market dynamics with drivers, restraints and opportunities with their impact are provided in the report. The report also provides competitive landscape to understand the current stance of particular player. The report provides insights on global wafer cleaning equipment market are offering technology, equipment type, wafer size, application and major geographic regions. The wafer cleaning equipment market analysis is provided for major regional markets including North America, Europe, Asia-Pacific, Latin America, and Middle East & Africa. For each region, the market size for different segments has been covered under the scope of report.
Asia Pacific accounts to hold major market share and is likely to drive the growth of wafer cleaning equipment market during forecast period. The demand in Asia Pacific for wafer cleaning equipment holds the largest share, and the Chinese low-cost labor, invention from Taiwan and innovations in processing plants and Japanese processing technologies in the semiconductor industry are among the cutting edge developments in Asia Pacific. Asia Pacific has been also an important trading partner for the microelectronic equipment cleaning industry, while in the past few years North America has been rising steadily in the demand for semiconductor equipment.
Major players included in this report SEMI, SCREEN Holdings Co., Ltd., PVA TePla AG, SHIBAURA MECHATRONICS CORPORATION, Tokyo Electron Limited, LAM RESEARCH CORPORATION, Applied Materials, Inc., Modutek, ENTEGRIS, INC., Veeco Instruments Inc. Axus Technologies, Mei Llc, Akrion Systems LLC, Cleaning Technologies Group, Inc., Inseto, Axcelis, FSI International, Dainippon Screen Mfg. Co., Ltd., Falcon Process Systems, and others.
The global wafer cleaning equipment market is segmented as below:
Wafer Cleaning Equipment Market By Technology
Wafer Cleaning Equipment Market By Equipment Type
Wafer Cleaning Equipment Market By Wafer Size
Wafer Cleaning Equipment Market By Application
Wafer Cleaning Equipment Market By Geography
Middle East & Africa
Wafer cleaning process is the removal without modifying surface content of chemical and particulate impurities from the surface of the semiconductor.
Growing environmental concerns regarding dangerous gases and chemical is a major factor expected to restraint the growth of the market.
Increase in the number of cleaning methods during manufacturing is the major drivers for the growth of the wafer cleaning equipment market.
The market value of wafer cleaning equipment is anticipated to be worth around US$ 14,500 Mn in 2027.
The wafer cleaning equipment market is anticipated to grow around 10% CAGR amid the forecast period 2020-2027.
Asia Pacific held maximum share in 2019.
Asia Pacific is projected to grow at a fast pace during forecast period from 2020-2027.