It is a crucial process for the production of semiconductor equipment and is a component of the set of instruments for nanotechnological materials synthesis. ALD is regarded as one of the superior methods of deposition for thin and conformal film production.
The report provides analysis of global Atomic Layer Deposition market for the period 2015-2026, wherein 2019 to 2026 is the forecast period and 2018 is considered as the base year. According to Acumen Research and Consulting, the global Atomic Layer Deposition market is expected to grow at strong CAGR around 11.5 % throughout the forecast period and reach around US$ 3.2 billion by 2026.
In particular in the Asia Pacific and North America, the sector is expected to be driven by the increasing electronics industry and semiconductor solutions. In the production of semiconductor categories like copper electromagnetic electrodes, dielectric high k stacks, and copper barrier / seed layers, various deposition instruments have been used. The increasing demand of automobile electronic components is expected to boost demand for semiconductors and therefore to have a direct positive effect on the atomic layer deposition market.
The miniaturization component is one of the recent advances in the global electronics industry. Materials such as pore, Hf(Si)O, SiOC, ZrO, LaO, AlO, and SiC have been introduced over the last few years to increase substrates effectiveness and stability. Some other factors driven by today's and emerging applications include increased demand for tin-sensitive solar cells, improved efficiency, and technological development. However, high investment costs in R&D are expected to curb its application in several sectors, and many manufacturers prefer nuclear layer deposition to produce smaller, comparatively low-cost components.
More worries about global warming and climate change have encouraged renewable and green energy sources to governments around the globe. The government subsidies have stimulated the development of the solar power sector. The thin film materials with their efficiency and reliability overcome this problem. This material provides miniaturisation and is one of the reasons for the growing use of microcomponents by MEMS industry. In countries like Germany, India, the United States and the UK governments have provided tax incentives and programs to promote the use of renewable energy sources.
With significant share of chemical vapor (CVD), the global vapor deposition industry has rapidly expanded. Epitaxy, PVD, and atomic layer deposition are other technologies. However, high deposition performance, high production rate, and minimum waste are the result of advanced, feature-rich outputs of ALD systems.
In most high-end products in the automotive, other transport, wearable health monitoring devices and solar photovoltaics industries. The technology is present. ALD is an important technology in the production of state-of - the-art electronic products to reduce costs. For a number of specific applications ALD manufactures the lightness, longevity and accuracy of LED optic layers. In the field of medical technology, biosynthesized ALD coatings increase the life of different medical implants.
The largest type of product segment in 2026, estimated at $320 million in 2018, is expected to remain the aluminum oxide ALD. Due to the high aluminum content, demand is projected to increase in industrial penetration for aluminum oxide films using this deposition technique. The deposited film aluminum oxide is known to contain effective permeation barriers due to its morphology and uniformity without pine-hole alumina. Due to its excellent characteristics, stability to numerous substrata, easy pre-cursor material availability and optimum basic metal prices, the aluminum oxide film takes the highest part in the technology.
The precursor material and substrate technological developments are an important industry trend. The progression has led to the rapidly growing deposition of plasma enhanced-atomic layer (PEALD). Due to its features such as thickness control and superior conformity, PEALD is a key enabler to logical devices and nanoscale memory.
The extensive research initiatives on improved nucleation technology resulted in particulate matter and polymers being deposited. Due to the high capital costs and specific applications, this type of technology holds smaller market share. ALD on polymers, for example, alleviates many challenges regarding space polymers. However, the oxygen-atom erosion rate and ultraviolet vacuum (VUV) in spacecraft polymers are reduced.
There are many promising fields of application in the atomic layer deposition industry. In 2018, the semiconductor sector was the leading application sector with more than 40% of the total revenue in the same year. In fact, the transition from semiconductor technology and the drive for miniaturized parts has helped the global semiconductor industry develop. The requirement for shrinking device dimensions in conjunction with long durability has greatly increased the deposition technology application.
A rapid increase of the solar industry has resulted from changing consumption preferences and government initiatives to reduce greenhouse gas emissions. This technique is used widely in solar cells and devices for conformal coating. The fastest-growing application sector during the prediction period is expected to be solar devices.
The high growth of solar energy is mainly driven by increasing photovoltaic installations in economies like China, United States. Japan, India, Poland and Great Britain. The ideal solar markets are countries like India and Japan due to high insolation, higher energy costs, increased concerns about greenhouse gas emissions, and low electrification costs.
Asia-Pacific dominated the 2016 region with an estimated turnover of more than USD 504 million that year. As demand for end-use industries such as semiconductors, electronics and medical equipment as well as the solar sector has rapidly increased, Asia Pacific has achieved maximum market share. China South Korea, and Taiwan have increased demand for deposition technology due to their deep-rooted electronics manufacturing base. The growth of this region was supported by the proliferation of electronic manufacturing products, huge modernization and increasing economies combined with the increase of consumer electronics spending.
In 2018 the market capitalization of the ALD market in North America was followed by Asia Pacific. The United States and Canada play a major role in regional market growth. The United States emerged as the borderline and in the next eight years it is expected to grow by more than 12 percent. The major driver of growth for North America includes productive regulatory government support to promote domestic private investment, which is likely to play an important role for the growing semiconductor and consumer electro-generating sector in the region.
Global Atomic Layer Deposition Market, By Product
Global Atomic Layer Deposition Market, By Application
Global Atomic Layer Deposition Market, By Geography
The market research study on “Atomic Layer Deposition Market - Global Industry Analysis, Market Size, Opportunities and Forecast, 2019 - 2026” offers detailed insights on global Atomic Layer Deposition market segments with market dynamics and their impact. The report also covers basic technology development policies.
The report provides an analysis of the latest industry trends from 2015 to 2026 in all sub-segment segments and forecasts revenue and volume growth on the global, the regional and country levels. ARC has divided the global market report of medical oxygen concentrations on product, application, technology and region for this study.
Key Players & Strategies
Increased competition among the major international players is born from global nuclear deposition (ALD). The most important aspects of competition are technological progress and innovative product launches. Lam Research Corporation, ASM International NV, Applied Materials Inc., Aixtron SE and Adeka Corporation are key companies in the industry.
Recurring technological improvements and product launches for producing high quality conformal films and gaining sustainability have also been undertaken by some of the major enterprises. Companies work on these aspects in terms of consumer demand and the dynamics of industry. Denton Vacuum LLC, Tokyo Electron Limited, Kurt J. Lesker Company, Veeco Instrument, Beneq Oy, Canon Anvela Corp., Picosun Oy, Entergis Inc. and ALD NanoSolutions, inc. are among the other industrial players that supply this technology.
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